Dr. Hailin Peng is a full professor at Peking University, China. He received his B.S. in chemistry from Jilin University in 2000, and a PhD in physical chemistry from Peking University in 2005. He pursued postdoctoral studies at Stanford University during 2005-2009. His current research interests focus on controlled growth, chemical modifications, heterostructures and functional devices of high-mobility 2D materials, such as graphene and layered bismuth oxychalcogenides (Bi2O2Se, Bi2SeO5). He has issued 90 patents and published more than 300 papers including Science, Nature, Nature Materials, Nature Chemistry, Nature Nanotechnology, Nature Electronics, Nature Methods, etc. He received many awards, including New Cornerstone Investigator (2025), Youqi Tang award (2025), Distinguished Professor Chang Jiang Scholarship (2022), XPLORER PRIZE (2021), Young Scientist Award - Ministry of Education of China (2018), "Ten thousand plan" - National high level talents special support plan (2018), the second prize of National Natural Science Award of China (2017), SMALL Young Innovator Award (2017), the MRS Singapore ICON-2DMAT Young Scientist Award (2017), and National Science Fund for Distinguished Young Scholars of China (2015). He is currently the Dean of the College of Chemical and Molecular Engineering of Peking University, the Director of the Center for Nanoscience & technology of Peking University, the deputy dean of the Beijing Graphene Institute (BGI), and the deputy director of the National Nanoscience Center.
Speech Title: 2D Bismuth Oxyselenide for Future Electronics
Abstract: Our recent studies will be discussed, focusing on the controlled synthesis and interfacial modulation of high-mobility 2D semiconductors such as layered bismuth oxyselenide (Bi2O2Se) and its van der Waals native oxide Bi2SeO5, along with their electronic and optoelectronic properties. In particular, we report on chemical vapor deposition (CVD) growth and molecular beam epitaxy (MBE) of large-area layered Bi2O2Se single crystals, which exhibit excellent air stability, moderate bandgap values of ~0.8 eV, a low electron effective mass of ~0.14 m0, and ultrahigh Hall mobility. Wafer-scale 2D Bi2O2Se crystals can be grown on the industrial substrate such as R-plane sapphire and fabricated into high-performance field-effect transistors. Atomically thin high-k native oxide bismuth selenite (both alfa-phase and beta-phase Bi2SeO5) can be conformally formed on the underlying 2D Bi2O2Se via layer-by-layer oxidation. Large-area layered Bi2SeO5 films can be facilely synthesized and used as ultrathin ferroelectric oxides, high-k dielectrics, and as encapsulation layers for 2D electronics. Using an epitaxial high-k native-oxide gate, the first 2D Bi2O2Se fin field-effect transistor (2D FinFET), 2D gate-all-around (GAA) logic, and novel reconfigurable logic-in-memory circuits based on 2D ferroelectric FETs (FeFETs) - operate at sub-1 V - were recently developed and integrated, holding great promise for future high-performance device applications.